MechSE Illinois

University of Illinois at Urbana Champaign
Not logged in

Karl Suss MJB3 Mask Aligner

The Karl Suss MJB3 Mask Aligner is designed for high resolution photolithography in a cleanroom environment. It offers flexibility in the handling of irregularly shaped substrates and pieces of differing thicknesses, as well as standard size wafers up to 3in in diameter and masks up to 4 inch x 4 inch. Process settings include soft contact, hard contact, and vacuum contact.