MechSE Illinois

University of Illinois at Urbana Champaign
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Olympus Wafer Inspection Optical Microscope

The Olympus microscope has eyepieces of 10x magnification with a reticle and 4 objectives of 5x, 10x, 20x, 50x, and 100x magnification. The Olympus can further be magnified by 2x and is also capable of Nomarski (DIC) microscopy. It also has brightfield and darkfield capabilities. A UV filter is available for photolithography wafer inspection. The AnalySIS Imager V5.0 software allows for images to be captured and features like magnification and vertical/horizontal measurement analysis.