MechSE Illinois

University of Illinois at Urbana Champaign
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Cleanroom Equipment Reservations

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Contact Info

General Inquires:

Joe Maduzia
Ph: 217-244-6302
Email: jmaduzi2@illinois.edu

Staff Assisted R&D:

Glennys Mensing
Ph: 217-333-5694
Email: gmensing@illinois.edu

MNMS Cleanroom
213 Mechanical Engineering Building
1206 W Green St
Urbana, IL 61801

Select Equipment to view Usage/Availability
5-axis stage E-jet
Located in 2232MEL. Precision 5-axis (XYZ + tip/tilt) stage with 2 additional manual z-stages, traditionally used for e-jet.
Acid Hood - Hydrofluoric Acid Use
* Located in MNMS Cleanroom (213 MEB). Required for monitoring HF waste generation
Bonder
Located in MNMS Cleanroom (213 MEB). EVG 501S Bonder, capable of heating to 500°C and applying force of up to 3.5kN (Max force depends on sample and bondtool material and geometry).
Carrier Wafer Mounting Chuck
Located in MNMS Cleanroom (213 MEB). System Used to Mount Carrier Wafers for the Through Etching on the STS
Dicing Saw
Located in Prep Room (202A MEB). K&S 708 Dicing Saw; 4" Spindle, User must supply own blades
Goniometer
Located in MNMS Cleanroom (213 MEB). KSV Instruments Model: CAM 200
High Temp Furnace
Located in MNMS Cleanroom (213 MEB). Thermal Technology, Model 1000-4560-FP20. Capable of temperatures up to 1750°C (up to 2250°C with system modification). Max sample size is 1cmx1cm.
Hotplate - Prep Room (202A)
Located in Prep Room (202A MEB). Talboys Hotplate
ICP - DRIE Plasmatherm
Located in MNMS Cleanroom (213 MEB). Plasmatherm SLR 770, BOSCH Process
ICP - DRIE STS
Located in MNMS Cleanroom (213 MEB). STS Pegasus. For Silicon etching. No metals allowed.
Lapping System
Located in Prep Room (202A MEB). Lapmaster, 12" Platen.
Mask Aligner - EVG 620
Located in MNMS Cleanroom (213 MEB). EV Group 620 Double Side Aligner. Mask size 4x4" or 5x5". Substrate size 4", 3", 2" diameter or 1" pieces
Mask Aligner - EVG 420
Located in MNMS Cleanroom (213 MEB). EV Group 420 Double Side Aligner, Wavelength 405nm. Mask size 5x5" and substrate 4" diameter
Mask Aligner - MJB3 Suss
Located in MNMS Cleanroom (213 MEB). MJB3 Suss Aligner. Mask size 4x4", 3x3", or 2x2". Substrate size 3" or 2" diameter or pieces
Microscope - Leica DMIRE
Located in Microscopy Suite (212 MEB). The Leica DMIRE inverted microscope has top and bottom illumination along with a UV light source and a motorized stage. There are 3 light cubes for fluorescence work including DAPI (Ex 360nm/Em 470nm), FITC (Ex 480nm/Em 527nm), and Rhodamine (Ex 546nm/Em 600nm) as well as a brightfield cube. The spectral outputs of the cubes are on a data sheet near the microscope. There are 5 objectives including 2.5X, 5X, 10X, 20X, and 50X. The microscope does have a camera and software for image generation.
MVD
Located in MNMS Cleanroom (213 MEB). Applied MicroStructures, Model 100, Molecular Vapor Deposition
Oven - Curing
Located in MNMS Cleanroom (213 MEB). Yamato, Mechanical Convection Oven,
Oven - Vacuum
Located in MNMS Cleanroom (213 MEB). Vacuum Oven
Prep Room Fume Hood
Located in Prep Room(202A MEB). Fume Hood in Prep Room for Hazardous Materials
Probe Station
Located in MNMS Cleanroom (213 MEB). Signatone S-1170
Profilometer - 212 MEB
Located in Microscopy Suite (212 MEB). KLA Tencor Alpha-Step IQ Surface Profilometer
Profilometer - Cleanroom
Located in MNMS Cleanroom (213 MEB). Alpha Step D-500 - 2µm tip
RIE - Axic
Located in MNMS Cleanroom (213 MEB). Reactive Ion Etcher, O2, Ar, CF4, 500W RF, Computer Controlled
RIE - March Jupiter III
Located in MNMS Cleanroom (213 MEB). Reactive Ion Etcher, O2, Ar, ArH2, 300W RF, Manually Controlled
SEM - Cambridge S200
Located in Microscopy Suite (212 MEB). Cambridge S200 Scanning Electron Microscope. Theoretical Magnification: 0.6X-5KX at 300V, 6X-50kX at 3kV, 30X - 280kX at 30kV.
SEM - Hitachi S570
Located in Microscopy Suite (212 MEB). Hitachi S570 Scanning Electorn Microscope. 20X-100kX magnification w standard specimen stage .12X-100kX with large-sized specimin stage. 0.5-30kV accelerating voltage. 150mm maximum specimen diameter. 6mm, 15mm, or 50mm diameter stub size.
Sonic Mill
Located in Prep Room (202A MEB). Used for drilling single or multiple holes/shapes into brittle materials (i.e. Si, SiO2, Al2O3, etc.)
Spinner (Left)
Located in MNMS Cleanroom (213 MEB). BidTec SP-100, 0-7500 rpm, 15" Bowl
Spinner (Right)
Located in MNMS Cleanroom (213 MEB). BidTec SP-100, 0-7500 rpm, 15" Bowl
Spinner - Glovebox
Located in MNMS Cleanroom (213 MEB). Laurell WS-400 in Glovebox
Spinner - MEL 2232
Located in MEL Cleanroom (2232 MEL). Spinner for PDMS
Spinner, High-Speed
Located in MNMS Cleanroom (213 MEB). CEE-100, 0-10,000 rpms
Sputterer - Dielectric
Located in MNMS Cleanroom (213 MEB). 3 Gun Dielectric Targets - See system for material list
Sputterer - Metals - AJA
Located in MNMS Cleanroom (213 MEB). 8 Gun Metal Targets - See system for material list
Supercritical Point Dryer
Located in MNMS Cleanroom (213 MEB). Tousimis Automegasamdry -915B: 6" and smaller sample size
Transfer Printer - Large
Located in MEL Cleanroom (2232 MEB). Precision 4-axis (XYZ + rotation) stage, accepts 1"x3" glass slides held by vacuum chuck.
Transfer Printer - Laser
Located in MEL Cleanroom (2232 MEL). Precision 3-axis (XYZ), with 30W 805nm CW diode laser with a dichoric filter.
Tube Furnace - Anneal Tube
Located in MNMS Cleanroom (213 MEB). Max Temp 1200°C. Used for annealing silicon. No metals or other materials allowed.
Tube Furnace - Boron Tube
Located in MNMS Cleanroom (213 MEB). Max Temp 1200°C. Used for boron doping Silicon. No metals or other materials allowed.
Tube Furnace - Dirty Tube
Located in MNMS Cleanroom (213 MEB). Max Temp 1200°C. General use tube.
Tube Furnace - Oxidation Tube
Located in MNMS Cleanroom (213 MEB). Max Temp 1200°C. Used for growing thermal oxide films on Silicon. No metals or other materials allowed.
Tube Furnace - Phosphorus Tube
Located in MNMS Cleanroom (213 MEB). Max Temp 1200°C. Used for phosphorus doping Silicon. No metals or other materials allowed.
Vacuum Annealer
Located in MNMS Cleanroom (213 MEB).
Vibrometer
Located in Microscope Suite (212 MEB). Polytec laser vibrometer is used to measure displacement or velocity of vibrations. The Polytec OFV-3001, frequency range: DC to 20MHz, velocity rang: 0.3um/s to 10m/s.