| Select Equipment to view Usage/Availability |
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- 172nm Lamp (Cygnus)
- 172nm flood exposure tool
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- 5-axis stage E-jet
- Located in 2232MEL. Precision 5-axis (XYZ + tip/tilt) stage with 2 additional manual z-stages, traditionally used for e-jet.
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- AFM (Dimension 3000)
- This tool has fast scanning capabilities in air, closed-loop, high precision scanner, and can scan on either Tapping mode, Contact mode, and STM mode.
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- Bonder
- Located in MNMS Cleanroom (213 MEB). EVG 501S Bonder, capable of heating to 500°C and applying force of up to 3.5kN (Max force depends on sample and bondtool material and geometry).
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- Dicing Saw
- Located in Prep Room (202A MEB). K&S 708 Dicing Saw; 4" Spindle, User must supply own blades
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- Electroplating Station
- Located in MNMS Cleanroom (213 MEB). Midas Six-Station Plating System, 1-Liter. Temp up to 100C. The first station is designed for electrocleaner, the second for acid dip, the third for plating. Remaining three stations are for rinse. First step in training is to determine if electroplating process allowed in this tool.
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- Evaporator
- Located in MNMS Cleanroom (213 MEB). E-Beam Evaporator - 4 Pocket
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- Goniometer
- Located in MNMS Cleanroom (213 MEB). KSV Instruments Model: CAM 200
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- High Temp Furnace
- Located in MNMS Cleanroom (213 MEB). Thermal Technology, Model 1000-4560-FP20. Capable of temperatures up to 1750°C (up to 2250°C with system modification). Max sample size is 1cmx1cm.
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- Hotplate - Prep Room (202A)
- Located in Prep Room (202A MEB). Talboys Hotplate
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- ICP - DRIE Plasmatherm
- Located in MNMS Cleanroom (213 MEB). Plasmatherm SLR 770, BOSCH Process
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- ICP - DRIE STS
- Located in MNMS Cleanroom (213 MEB). STS Pegasus. For Silicon etching. No metals allowed.
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- Lapping System
- Located in Prep Room (202A MEB). Lapmaster, 12" Platen.
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- Mask Aligner - EVG 620
- Located in MNMS Cleanroom (213 MEB). EV Group 620 Double Side Aligner. Mask size 4x4" or 5x5". Substrate size 4", 3", 2" diameter or 1" pieces
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- Mask Aligner - EVG 420
- Located in MNMS Cleanroom (213 MEB). EV Group 420 Double Side Aligner, Wavelength 405nm. Mask size 5x5" and substrate 4" diameter
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- Mask Aligner - MJB3 Suss
- Located in MNMS Cleanroom (213 MEB). MJB3 Suss Aligner. Mask size 4x4", 3x3", or 2x2". Substrate size 3" or 2" diameter or pieces
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- Microlight3D
- Maskless Aligner and Exposure Tool
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- Microscope - Leica DMIRE
- Located in Microscopy Suite (212 MEB). The Leica DMIRE inverted microscope has top and bottom illumination along with a UV light source and a motorized stage. There are 3 light cubes for fluorescence work including DAPI (Ex 360nm/Em 470nm), FITC (Ex 480nm/Em 527nm), and Rhodamine (Ex 546nm/Em 600nm) as well as a brightfield cube. The spectral outputs of the cubes are on a data sheet near the microscope. There are 5 objectives including 2.5X, 5X, 10X, 20X, and 50X. The microscope does have a camera and software for image generation.
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- MVD
- Located in MNMS Cleanroom (213 MEB). Applied MicroStructures, Model 100, Molecular Vapor Deposition
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- Oven - Curing
- Located in MNMS Cleanroom (213 MEB). Yamato, Mechanical Convection Oven,
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- Oven - Vacuum
- Located in MNMS Cleanroom (213 MEB). Vacuum Oven
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- Prep Room Fume Hood
- Located in Prep Room(202A MEB). Fume Hood in Prep Room for Hazardous Materials
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- Probe Station
- Located in MNMS Cleanroom (213 MEB). Signatone S-1170
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- Profilometer - Cleanroom
- Located in MNMS Cleanroom (213 MEB). Alpha Step D-500 - 2µm tip
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- RIE - Axic
- Located in MNMS Cleanroom (213 MEB). Reactive Ion Etcher, O2, Ar, CF4, 500W RF, Computer Controlled
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- SEM - Hitachi S-2250N
- Tungsten filament SEM with both high vacuum (4.5nm resolution) and low vacuum (10nm resolution) modes. Low vauum (N SEM or Environmental SEM) mode capable of 0.01 - 2 Torr pressure control for biological and non-conductive sample microscopy. Detectors include SE, Robinson BSE, Solid State BSE, and Oxford INCA EDS.
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- SEM - Hitachi S570
- Located in Microscopy Suite (212 MEB). Hitachi S570 Scanning Electorn Microscope. 20X-100kX magnification w standard specimen stage .12X-100kX with large-sized specimin stage. 0.5-30kV accelerating voltage. 150mm maximum specimen diameter. 6mm, 15mm, or 50mm diameter stub size.
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- Sonic Mill
- Located in Prep Room (202A MEB). Used for drilling single or multiple holes/shapes into brittle materials (i.e. Si, SiO2, Al2O3, etc.)
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- Spinner (Left)
- Located in MNMS Cleanroom (213 MEB). BidTec SP-100, 0-7500 rpm, 15" Bowl
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- Spinner (Right)
- Located in MNMS Cleanroom (213 MEB). BidTec SP-100, 0-7500 rpm, 15" Bowl
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- Spinner - Glovebox
- Located in MNMS Cleanroom (213 MEB). Laurell WS-400 in Glovebox
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- Spinner, High-Speed
- Located in MNMS Cleanroom (213 MEB). CEE-100, 0-10,000 rpms
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- Sputterer - Dielectric
- Located in MNMS Cleanroom (213 MEB). 3 Gun Dielectric Targets - See system for material list
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- Sputterer - Metals - AJA
- Located in MNMS Cleanroom (213 MEB). 8 Gun Metal Targets - See system for material list
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- Supercritical Point Dryer
- Located in MNMS Cleanroom (213 MEB). Tousimis Automegasamdry -915B: 6" and smaller sample size
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- Tech Schedule
- Tech Schedule
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- Transfer Printer - Large
- Located in MEL Cleanroom (2232 MEB). Precision 4-axis (XYZ + rotation) stage, accepts 1"x3" glass slides held by vacuum chuck.
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- Transfer Printer - Laser
- Located in MEL Cleanroom (2232 MEL). Precision 3-axis (XYZ), with 30W 805nm CW diode laser with a dichoric filter.
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- Tube Furnace - Anneal Tube
- Located in MNMS Cleanroom (213 MEB). Max Temp 1200°C. Used for annealing silicon. No metals or other materials allowed.
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- Tube Furnace - Boron Tube
- Located in MNMS Cleanroom (213 MEB). Max Temp 1200°C. Used for boron doping Silicon. No metals or other materials allowed.
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- Tube Furnace - Dirty Tube
- Located in MNMS Cleanroom (213 MEB). Max Temp 1200°C. General use tube.
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- Tube Furnace - Oxidation Tube
- Located in MNMS Cleanroom (213 MEB). Max Temp 1200°C. Used for growing thermal oxide films on Silicon. No metals or other materials allowed.
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- Tube Furnace - Phosphorus Tube
- Located in MNMS Cleanroom (213 MEB). Max Temp 1200°C. Used for phosphorus doping Silicon. No metals or other materials allowed.
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- Vacuum Annealer
- Located in MNMS Cleanroom (213 MEB).
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- Vibrometer
- Located in Microscope Suite (212 MEB). Polytec laser vibrometer is used to measure displacement or velocity of vibrations. The Polytec OFV-3001, frequency range: DC to 20MHz, velocity rang: 0.3um/s to 10m/s.
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